Method of manufacturing rare earth thick film magnet, motor and actuator comprising rare earth thick film magnet manufactured by the manufacturing method, and method of manufacturing same

ABSTRACT

The method of manufacturing rare earth thick film magnet comprising a step of forming an alloy layer of 30-100 μm thick having a general formula R X B Y TM Z  on a substrate by a physical deposition process, and a step of heat-treating the alloy layer to form a thick film magnetic layer having R 2 TM 14 B phase as a main phase. In the general formula, R is at least one of rare earth elements, B is boron, TM is iron or its alloy partly substituted by cobalt. X is 0.1-0.2, Y is 0.05-0.2 and Z=1−X−Y. Further, the method of the present invention includes a step of laminating a plurality of alloy layers formed on a substrate together with the substrate. A motor comprising rare earth thick film magnet of the present invention is extremely small while obtaining high output.

FIELD OF THE INVENTION

[0001] The present invention relates to a method of manufacturing rareearth thick film magnet, and a micro-sized high-performance motor oractuator used as a driving source in the development of miro-robots,medical instruments, space crafts or the like using rare earth thickfilm magnet, and a method of manufacturing same.

BACKGROUND OF THE INVENTION

[0002] Japanese Patent Laid-Open Publication No. 05-21865 discloses amethod of forming rare earth thin film magnet on a substrate such as aglass substrate, quartz substrate, and silicon wafer by a spatteringmethod. In the Publication, a method of forming a metallic layer betweenthe substrate or the like and the rare earth thin film magnet isdisclosed. A spattering method is generally employed for forming rareearth thin film magnet.

[0003] Japanese Patent Laid-Open Publication No. 06-151226 discloses arare earth thin film magnet in that a metallic layer of about 1 to 40 nmin film thickness and an R₂Fe₁₄B (R is rare earth element including Y)alloy layer of less than 5 μm in film thickness having anisotropy in thedirection of film thickness are alternately laminated to form rare earththin film magnet by a spattering method. Japanese Patent Laid-OpenPublication No. 08-83713 discloses optimum manufacturing conditions in aspattering method for rare earth thin film magnet having Nd₂Fe₁₄B asmain phase: that is, substrate temperature of 530 to 570° C.,film-formation speed of 0.1 to 4 μm/hr, and gas pressure of 0.05 to 4Pa.

[0004] Further, Japanese Patent Laid-Open Patent Publication No.09-162034 discloses a film magnet having multi-layer alloy film in thata hard magnetic layer comprising so-called rare earth magnet such asNd₂Fe₁₄B, SmCo₅, Sm (Co, Fe, Cu, Zr)₇, SmFe₁₁Ti, Sm₂Fe₁₇N₂, and a softmagnetic layer such as Fe, Fe—Ni, Fe—Co, Fe—Si, Fe—N, Fe—B arealternately laminated. The laminated multi-layer alloy film structurecomprises the hard magnetic layer having a thickness of 2 to 4 nm perlayer manufactured by a spattering at a substrate temperature of 450 to800° C. and having anisotropy in the direction of thickness; and thesoft magnetic layer having a thickness of 6 to 12 nm per layermanufactured by a spattering at a substrate temperature of 150 to 650°C. and having anisotropy in the direction of thickness.

[0005] Also, Japanese Patent Laid-Open Publications No. 09-237714 andNo. 11-214219 disclose a multi-layer rare earth thin film magnet of 0.01to 300 μm thick, in that a soft magnetic layer and a hard magnetic layerare formed adjacent to each other in a in-plane direction of a film, andformed, for example, by a spattering method at substrate temperature of300 to 800° C. and are strictly controlled in thickness at nm level.

[0006] However, in the manufacturing of rare earth thin film magnet by aspattering method, it is necessary to heat the substrate up to 450° C.at least, and moreover, the film-formation speed is as low as 0.1 to 4μm/hr. Particularly, in the case of a rare earth thin film magnet havingNd₂Fe₁₄B as main phase, the film thickness is limited to less than 5 μmin order to suppress the lowering of coercivity due to oxidation. Also,in the case of a multi-layer rare earth thin film magnet of 0.01-300 μmthick with the thickness of soft magnetic layer and hard magnetic layerstrictly controlled at an nm level, the method of manufacturing themagnet is more complicated and less economical.

[0007] In Japanese Patent Open-Laid Publication No. 11-288812 R—Fe—Bbased rare earth thin film magnet (hereafter R stands for rare earthelement) is disclosed which is heat-treated after film-formation by aspattering method without heating the substrate. However, this methodalso involves problems such that the film-formation speed is less than 4μm/hr and that the film thickness of the magnet is limited to less thanteen μm.

[0008] On the other hand, there is a strong demand for miniaturizationof electromagnetic motors and actuators. The points for miniaturizationof motors and actuators are to reduce the number of components and tosimplify the assembly. In this respect, the mover of a miniaturizedmotor or actuator is generally configured by using rare earth sinteredmagnet manufactured by a powder metallurgical process or rare earth bondmagnet manufactured by forming spun-melt magnetic powder into a specificshape with use of resin.

[0009] Also, there are two types of motors, from the positionalrelations of magnet and armature coil. One type is an axial air gap typewherein the magnet and armature coil have gaps in the axial directionand another type is a radial air gap type wherein the magnet andarmature coil have gaps in the radial direction. However, in a case of amillimeter-sized motor or actuator (axial air gap type) of 5 mm indiameter and 1 mm in height as shown in FIG. 1, which is an object ofthe present invention, it is also necessary to manufacture the rareearth magnet of the mover by 300 μm or less in thickness.

[0010] In FIG. 1, reference numeral 1 shows rare earth magnet; 2 arotary shaft; 3 a bearing; and 4 an armature coil.

[0011] The crystal grain size of R—TM(transition metal)—B based rareearth sintered magnet is generally as large as 6 to 9 μm, and sincethere exists an R rich layer in the grain boundary, the magneticperformance of the surface layer is deteriorated during grindingoperation, reaching as deep as about several tens μm from the surface.Also, since the material is brittle and hard to process, the processinglimit taking into account the yield is estimated to be about 300 to 500μm, and it is difficult to apply to such a millimeter-sized motor asshown in FIG. 1.

[0012] On the other hand, the crystal grain size of R—TM—B based rareearth bond magnet is as small as 20 to 100 μm, and when the grain sizeis less than 50 μm, the coercivity tends to become more dependent on thegrain size. As a result, if the magnet is thinned, it will be unable toavoid the lowering of the magnetic performance due to worsening of thepowder magnetic characteristic and lowering of the magnet density. Thus,the processing limit taking into account of a maintenance of magneticperformance and a production yield is estimated to be about 300 to 500μm.

[0013] As described above, in the case of a millimeter-sized motor oractuator, it is not possible to make use of an original magneticperformance of rare earth magnet by employing the rare earth sinteredmagnet or the bond magnet manufactured by bonding spun-melt rare earthmagnetic powder with resin.

[0014] When a motor or actuator is miniaturized, the electromagneticforce is proportional to the third power of the dimension according tothe scaling rule. Therefore, for example, when the mover (magnet)becomes reduced to {fraction (1/10)}in size, the electromagnetic forceis decreased to {fraction (1/1000)}. Accordingly, in case rare earththin film magnet of less than 5 μm in film thickness is used as a mover,it is unable to obtain an electromagnetic force corresponding to theload in actual use.

SUMMARY OF THE INVENTION

[0015] The method of manufacturing rare earth thick film magnet of thepresent invention comprises a step of forming an alloy layer of 30-100μm thick whose composition is shown by a general formulaR_(X)B_(Y)TM_(Z) on a substrate by a physical deposition method, and astep of heat-treating the alloy layer to forming a thick film magneticlayer having R₂TM₁₄B phase as a main phase.

[0016] Where, R is at least one of rare earth elements, B is boron, TMis iron (Fe) or its alloy with Fe partly substituted by cobalt (Co); andX=0.1-0.2, Y=0.05-0.2and Z=1−X−Y.

[0017] Further, the manufacturing method of the present inventionincludes a step of laminating a plurality of the alloy layers formed onthe substrate together with the substrate.

[0018] Also, using iron of more than 13 kG in saturated magnetization,including at least one element selected from the group consisting ofnickel, cobalt, silicon, nitrogen and boron, as a substrate, a yoke of amover of a motor can be produced at a same time when the rare earththick film magnet is produced. This enables the simplification of theassembly of the motor by reducing a number of components. The abovemotor comprising rare earth thick film magnet of 30-500 μm thick isextremely small in size and still able to provide high output power.

BRIEF DESCRIPTION OF THE DRAWINGS

[0019]FIG. 1 shows a configuration of a motor comprising the magnet ofthe present invention.

[0020]FIG. 2 is schematic diagram of an essential portion of afilm-formation apparatus.

[0021]FIG. 3 shows hysteresis characteristic of a Nd_(2.6)Fe₁₄B thickfilm after forming on Ta substrate and these of the thick film beforeand after heat-treating the film at 550° C.

[0022]FIG. 4 is an X-ray diffraction pattern of the thick film magnet ofthe present invention.

[0023]FIG. 5 is a diagram showing a relation between substrate materialand coercive force after heat-treatment.

[0024]FIG. 6 is a diagram showing a relation between heat-treatingtemperature and coercive force.

[0025]FIG. 7 is a diagram showing a relation between heat treating timeand coercive force.

[0026]FIG. 8 is a schematic diagram of an essential portion a directlycurrent applying high-speed heat-treating apparatus.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0027] The present invention is a method of manufacturing rare earththick film magnet (hereafter referred to as “magnet”) of the presentinvention comprises a step of forming an R_(X)B_(Y)TM_(Z) alloy layer of30 to 100 μm in thickness on a substrate by a physical depositionmethod, and a step of forming at least one magnetic layer having R₂TM₁₄Bas a main phase by heat-treating the alloy layer.

[0028] Where, R is at least one of rare earth elements, B is boron, TMis iron (Fe) or its alloy with Fe partly substituted with cobalt (Co);and X=0.1-0.2, Y=0.05-0.2and Z=1−X−Y.

[0029] By using a laser abrasion method for the physical deposition, afilm-formation speed can be increased as high as about 50 μm/hr that ismore than 10 times the speed in a spattering method. As an element of Rin a target alloy composition for the laser abrasion, it is desirable toinclude at least one of Nd and Pr in particular, and Nd or Pr may bepartly substituted with Dy.

[0030] In the above composition, when an amount of R is less than 10atomic % (hereafter “at %”), sufficient coercive force is not obtained,and when more than 20 at %, the energy products [(BH) max.] and theremanence (Br) decrease due to a reduction of Fe component. When B isless than 5 at %, the coercive force is lowered, and when more than 20at %, (BH) max. and Br decrease.

[0031] The alloy composition of the target is desirable to beR_(X2)TM₁₄B (X2>2) that has more R component than a stoichiometriccomposition of R₂M₁₄B in particular, and the substrate is desirable tobe a soft magnetic material selected from the group consisting of Fe ofat least 13 kG in saturated magnetization, Fe—Ni, Fe—Co, Fe—Si, Fe—N,Fe—B. Further, it is possible to usc soft magnetic material with Tadisposed on a substrate surface or a soft magnetic material with Taion-implanted to suppress an oxidation of the deposited film.

[0032] As an example of film formation conditions of the laser abrasion,R—B—TM based alloy is formed under conditions such as forming speed ofmore than 50 μm/hr and degree of vacuum of below 10⁻⁶ Torr. After thefilm formation, the film is heat-treated at 650-750° C. of maximumtemperature to be a 50 μm thick magnetic film having a coercivity of atleast 6 kOe which can suppressing the irreversible demagnetizing rate ofthe magnet.

[0033] Also, after the film-formation of R—B—TM based alloy, a surfaceof the magnetic film can be smoothed while the film is pressed in adirection of thickness and electric current is directly applied to thefilm to crystallize the film with a Joule heat generated (so-calleddirect Joule heating).

[0034] Also, after the film-formation of R—B—TM based alloy, amulti-layered magnet can be produced by laminating a plurality of theformed films while the films are pressed in a direction of thickness andelectric current is directly applied to the films to crystallize thefilm with a Joule heat generated. In such case, a full-dense magnethaving high coercivity of more than 10 kOe can be obtained by a directlyelectric current application heating under following conditions. Aheating speed of not less than 9° C./sec., a press pressure of 200-400kgf/cm² and a degree of vacuum not higher than 1 Torr. If the pressureis less than 200 kgf/cm², it may sometimes result in a failure ofuniform heating, and if higher than 400 kgf/cm², the magnet may beexcessively deformed.

[0035] An axial air gap type thick film magnet motor can be manufacturedby disposing a mover and a stator opposing to each other via air gap,wherein the mover comprises above-described rare earth thick film magnetof 30-500 μm thick and a rotary shaft. Also, a thick film magnet motorcomprising a flat-plate mover and a flat-plate stator can be obtained.Or a radial air gap type magnet motor manufactured by disposing a moverand a stator opposing to each other via air gap wherein the movercomprises the thick film magnet crystallized by a heat treatment aftercurling it on a inner wall of the mover frame, and a rotary shaft.

EXAMPLE

[0036] The present invention will be further described in detail in thefollowing according to an example. Also it should be noted that thepresent invention is not limited to the example.

[0037]FIG. 2 is an schematic diagram illustrating an essential portionof a film-formation apparatus of the present invention.

[0038] In FIG. 2, Nd_(2.6)Fe₁₄B alloy is disposed as a target 21.Opposing to the target 21 a substrate made of Ta, W, Mo, SiO₂, Fe, Ta,ion-inplanted Fe or the like is disposed, the substrate is 25 mm×25 mmin size and 10 μm or 100 μm in thickness. The distance between thetarget 21 and the substrate 22 is 7 mm.

[0039] The target 21 and the substrate 22 are disposed in a vacuumchamber, and laser beam 23 having energy of 240-340 mJ is radiated for10-60 minutes to the target 21 under a vacuum of 5×10⁻⁷-2×10⁻⁶ Torr toform an alloy layer on the substrate 22.

[0040]FIG. 3 shows hysteresis characteristic of a Nd_(2.6)Fe₁₄B alloythick film after an one-hour film-formation on a Ta substrate by a laserabrasion and that of after a heat-treatment of the thick film at 550° C.In FIG. 3, reference numeral 31 shows in-plane hysteresis characteristicafter the film-formation; 32 vertical hysteresis characteristic afterthe film-formation; and 33 hysteresis characteristic after the heattreatment.

[0041] In the present example, from a relation of Hd=N/μ0×1 (Hd isdiamagnetic field; N is coefficient of diamagnetic field; μ0 is a vacuumpermeability), the thickness of the film formed can be estimated to be50 μm. That is, an alloy film-formation speed obtained is more than 10times greater than a film-formation speed of 4 μm/hr of a conventionalspattering method.

[0042] Also, at a stage before the heat treatment after thefilm-formation, no coercive force has been observed. However, as isapparent from the hysteresis curve 33 after 60 kOe pulse magnetizingafter the heat treatment, the Nd_(2.6)Fe₁₄B thick film (50 μm thick)shows a coercive force as large as more than 10 kOe.

[0043] A X-ray diffraction pattern of the magnetic thick film after theheat treatment is shown in FIG. 4. As is obvious from FIG. 4, though, aαFe phase also exists in the magnetic thick film, a Nd₂Fe₁₄B phase isobserved, and it is understood that the coercive force is due to theNd₂Fe₁₄B phase.

[0044]FIG. 5 is shows a relationship between the material for substrateand the coercive force after the heat treatment. Here, the coerciveforce is nomalized on the basis of Ta substrate as a reference. As shownin FIG. 5, Ta substrate shows the largest coercive force. Also, Fesubstrate with Ta ion-implanted for modifying a surface showed almost asame coercive force as that of Ta substrate. This is supposed that anoxidation of Nd is suppressed by Ta existing on the substrate surface.

[0045] The Ta implantation can be performed, for example, by such methodas disclosed in BROWN. I. G: “The Metal Vapor Vacuum-Arc (MEVVA) HighCurrent Ion Source”, IEEE Trans. on Nuclear Science, Vol. NS-32, No.5(1985). In this example, arc discharge is initiated in vacuum, and Taused as cathode is vaporized and ionized, then the ion is accelerated bya grid electrode with DC 70 kV applied, and the ion beam in a state ofbeing multi-charged is drawn out without mass separation and aredirectly implanted into Fe substrate of 99.98% purity. An amount of ionsinjected is 10¹⁷ ions/cm².

[0046] Thus, a high coercive force is obtained by using a Taion-implanted Fe substrate without using an expensive Ta substrate. Fromthis high coercive force, it can be understood that a magnet obtained bythe present invention is effective to reduce the number of componentsfor a mover of an extremely small-sized motor.

[0047]FIG. 6 shows a relation between the heat treatment temperature andthe coercive force of Nd_(2.6)Fe₁₄B thick film (50 μm thick) obtained.In FIG. 6, the heat treatment temperature is 450-750° C., and thekeeping time at each temperature is one hour. As is apparent from FIG.6, when the heat keeping time is one hour, the optimum temperature forthe heat treatment is around 550-650° C., and the coercive forceobtained is 6 kOe or more.

[0048]FIG. 7 shows a relation between a heat keeping time and thecoercive force in the range of heat treatment temperature of 500-750° C.As is apparent from FIG. 7, when the heat keeping time is within onehour, the optimum temperature for heat treatment shifts to highertemperature as compared with the optimum temperature at the one hourheat keeping. Also, when the heat treatment temperature is 650-750° C.,the shorter the keeping time, the larger the coercive force obtained,and the coercive force under the optimum heat-treating condition becomeslarger than 11 kOe.

[0049] Then, a test of high-speed heat treatment by a directly electriccurrent application has been conducted as shown in FIG. 8, whereNd_(2.6)Fe₁₄B thick film (50 μm thick) 81 formed on Ta ion-implanted Fesubstrate 82 is disposed between a pair of TiN/Si₃N₄ electrodes 83. Theheat treatment is performed in a vacuum chamber 84, and DC current isapplied from a pulse DC power 85 and a DC power 86 by switching with achangeover switch 87.

[0050] First, heating with directly electric current application in theabove configuration is explained. Heat dissipation to outside theheating system will be omitted in the explanation.

[0051] Since 1W=0.2389 cal/sec., temperature rising speed dT/dt (°C./sec.) due to the current application is as follows:

dT/dt=0.2389ΔI ² ×ρ/SC,

[0052] where, ΔI is a current density (A/cm²); ρ is volume resisitivity(Ωcm); C is specific heat (cal/° C.·g); and S is specific gravity (C×S:volume specific heat).

[0053] In other words, temperature rising speed dT/dt is in proportionto the second power of current density and volume resisitivity ρ, and ininverse proportion to volume specific heat. It has no relation with anelectrode distance.

[0054] Since ρ/SC at room temperature of TiN/Si₃N₄ used is approximately10⁻⁴ (Ωcm⁴·° C./cal), when current density ΔI is 300 A/cm² and 400A/cm², the high-speed heating of at 9° C./sec. and 16° C./sec.,respectively, can be possible.

[0055] Then, a high speed heat treatment is performed for 30 secondsunder the following conditions. First, the chamber pressure is evacuatedto 10⁻² Torr and DC pulse current of 0.5 second ON and 0.5 second OFFwith a current density of ΔI=200 A/cm² is applied while the 50 μm thickNd_(2.6)Fe₁₄B thick film on a 10 μm thick substrate is disposed betweenthe electrodes and pressed at 200 kgf/cm². Then a DC current of currentdensity ΔI=300 or 400 A/cm² is applied for 70 or 40 sec. After coolingto the room temperature, the 50 μm thick Nd_(2.6)Fe₁₄B thick film on a10 μm thick substrate is taken out and a surface roughness of the thickfilm Rmax is measured. Each of the test piece shows a surface roughnessof Rmax equivalent to a mirror finished surface of 100 nm of theelectrodes, showing that a surface shape of the electrodes istransferred to the surface of the thick film. After pulse magnetizing ofthe thick film by a magnetic field of 60 kOe, a coercive force of 12 kOeis obtained in each test piece.

[0056] Thus, increasing the heating speed is effective to increase thecoercivity of the thick film. Also, a multi-layer thick film magnet of300 μm was obtained by laminating and heat-pressing five layers of the50 μm thick Nd_(2.6)Fe₁₄B thick film on a 10 μm thick substrate withdirectly current application heating under the same conditions asdescribed above. The density of the obtained multi-layer thick filmmagnet is approximately 7.6 g/cm³. With volume fraction of Fe and magnettaken into account, the magnet density is estimated to be 55 g/cm³,thus, it has been confirmed that the multi-layer thick film magnet isso-called fully-dense magnet.

[0057] Next, the above multi-layer thick film magnet of 300 μm thick,4.2 mm in diameter and 2.0 mm in bore diameter is subjected todouble-pole magnetizing by pulse magnetic field of 30 kOe. A mover of 5mm in diameter and 1 mm thick is prepared using the multi-layer thickfilm magnet and rotary shaft which is to be built into amillimeter-sized motor as shown in FIG. 1. For comparison, Nd—Fe—B basedsintered magnet is ground to manufacture a mover having the samestructure.

[0058] The motor obtains a rotational force with power sequentiallyapplied to a 3-phase armature coil, and 3-phase signal is generated inan oscillation circuit and is applied to the armature coil. When themotor is driven by a synchronous motor driving (at 60 to 10000 rpm) inwhich a speed varies in accordance with the oscillation frequency, themaximum motor outputs is shown in Table 1. TABLE 1 Mover Max. output(mW) Present Example 14 Comparative example 8

[0059] As is seen in Table 1, millimeter-sized magnetic motor or anactuator with high output power can be obtained by using the thick filmmulti-layer magnet of the present invention in a mover.

[0060] As described above, in accordance with the present invention, athick film can be formed on a substrate at a high speed of more than 10times the film-formation speed in a conventional spattering method.Further, a thick film magnet having a high coercive force can beobtained through a crystallizing process by high-speed heat treatment.Such rare earth thick film magnet having a high coercive force is veryeffective to improve the performance of millimeter-sized motors oractuators, for example, in which a high-performance magnet of less than300 μm thick is needed. Such a small sized magnet is difficult tomanufacture by grinding of sintered magnet or forming of bond magnet.The thick film magnet of the present invention reduces a man-hour formillimeter-sized motor assembling operation and a number of components.

[0061] Also, in the above embodiment, a rotary type motor was describedas an example, but it should be noted that the magnet of the presentinvention can be used in a mover and a field magnet of anextra-small-sized linear motor, as well as for a rotary type motor.

[0062] In the above description, the composition of the thick filmmagnet is described as R_(X)B_(Y)M_(Z) alloy (where R is at least one ofrare earth elements; B is boron; M is Fe or Fe alloy with Fe partlysubstituted with Co; X: 0.1-0.2, Y: 0.05-0.2 and Z=1−X−Y), but the abovecomposition does not exclude unavoidable impurities contained in the rawmaterial.

What is claimed is:
 1. A method of manufacturing rare earth thick filmmagnet comprising: a step forming R_(X)B_(Y)TM_(Z) alloy layer of 30 to100 μm in thickness on a substrate by a physical deposition process; anda step of heat-treating said alloy layer to form a thick film magneticlayer having R₂TM₁₄B as main phase, where R is at least one selectedfrom rare earth elements, B is boron, TM is iron or iron alloy partlysubstituted by cobalt, and X: 0.1-0.2, Y: 0.05-0.2 and Z=1−X−Y.
 2. Themethod of claim 1, further comprising a step of laminating a pluralityof said alloy layers formed on said substrate.
 3. The method of claim 1,wherein said physical deposition process is a laser abrasion.
 4. Themethod of claim 1, wherein said substrate is made of iron including atleast one element selected from the group consisting of nickel, cobalt,silicon, nitrogen, and boron and having at least 13 kG in saturatedmagnetization.
 5. The method of claim 4, wherein said substrate includestantalum on a surface thereof.
 6. The method of claim 4, wherein saidsubstrate includes ion-implanted tantalum on a surface thereof.
 7. Themethod of claim 1, wherein a film-formation speed in said forming alloylayer is 50 μm/hr or more.
 8. The method of claim 1, wherein a degree ofvacuum in said forming alloy layer is 10⁻⁶ Torr or less.
 9. The methodof claim 1, wherein said alloy layer is heat-treated at 650-750° C., andthe coercive force of said rare earth thick film magnet is 6 kOe ormore.
 10. The method of claim 1, wherein said heat-treating step furthercomprises a step of applying electric current directly to said alloylayer while said alloy layer being pressed in a direction of thickness.11. The method of claim 10, wherein a surface of said alloy layer issmoothed by said pressing.
 12. The method of claim 2, wherein saidheat-treating step further comprises a step of applying electric currentdirectly to said plurality of laminated alloy layers while saidplurality of laminated alloy layers being pressing in a direction ofthickness.
 13. The method of claim 10, wherein said heat-treating isprocessed at a heating speed of higher than 9° C./second, at a pressureof 200-400 kgf/cm², and at a degree of vacuum of 1 Torr or less.
 14. Themethod of claim 10, wherein said heat-treating is processed at a heatingspeed of higher than 9° C./second, at a pressure of 200-400 kgf/cm², andat a degree of vacuum of 1 Torr or less.
 15. A motor comprising a rareearth thick film magnet manufactured by the method of any one of claims1 to
 11. 16. The motor of claim 14, wherein a mover and a stator areconfigured in flat-plate shape.
 17. A radial air gap type magnet motorcomprising: a mover comprising a rare earth thick film magnet and arotary shaft, said rare earth thick film magnet being crystallized by aheat treatment after being fixed to an inner wall of a mover frame bycurling; and a stator opposing to said mover via air gap.
 18. A methodof manufacturing a motor comprising rare earth thick film magnetcomprising: a step forming R_(X)B_(Y)TM_(Z) alloy layer of 30 to 100 μmin thickness on a substrate by a physical deposition process; a step ofheat-treating said alloy layer to form a thick film magnetic layerhaving R₂TM₁₄B as main phase; a step of manufacturing thick film magnetby magnetizing said thick film magnetic layer; and a step of buildingsaid thick film magnet into a motor, where R is at least one selectedfrom rare earth elements, B is boron, TM is iron or iron alloy partlysubstituted by cobalt, and X: 0.1-0.2, Y: 0.05-0.2 and Z=1−X−Y.
 19. Themethod of claim 18, further comprising a step of laminating a pluralityof said alloy layers formed on said substrate.
 20. The method of claim18, wherein said physical deposition process is a laser abrasion. 21.The method of claim 18, wherein said substrate is made of iron includingat least one element selected from the group consisting of nickel,cobalt, silicon, nitrogen, and boron and having at least 13 kG insaturated magnetization.
 22. The method of claim 18, wherein saidsubstrate includes tantalum on a surface thereof.
 23. The method ofclaim 18, wherein said substrate includes ion-implanted tantalum on asurface thereof.